Invention Grant
- Patent Title: Through-silicon via with air gap
- Patent Title (中): 透气通孔与气隙
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Application No.: US13028655Application Date: 2011-02-16
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Publication No.: US08436448B2Publication Date: 2013-05-07
- Inventor: Ming-Fa Chen
- Applicant: Ming-Fa Chen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A semiconductor substrate having a through-silicon via with an air gap interposed between the through-silicon via and the semiconductor substrate is provided. An opening is formed partially through the semiconductor substrate. The opening is first lined with a liner and then the opening is filled with a conductive material. A backside of the semiconductor substrate is thinned to expose the liner, which is subsequently removed to form an air gap around the conductive material of the through-silicon via. A dielectric layer is formed of the backside of the semiconductor substrate to seal the air gap.
Public/Granted literature
- US20110133335A1 Through-Silicon Via With Air Gap Public/Granted day:2011-06-09
Information query
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