Invention Grant
- Patent Title: Thin film photoelectric conversion device and method for manufacturing thin film photoelectric conversion device
- Patent Title (中): 薄膜光电转换装置及薄膜光电转换装置的制造方法
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Application No.: US12681091Application Date: 2008-12-10
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Publication No.: US08436444B2Publication Date: 2013-05-07
- Inventor: Jose Briceno
- Applicant: Jose Briceno
- Applicant Address: JP Tokyo
- Assignee: Si-Nano Inc.
- Current Assignee: Si-Nano Inc.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- International Application: PCT/JP2008/003686 WO 20081210
- International Announcement: WO2010/067398 WO 20100617
- Main IPC: H01L31/18
- IPC: H01L31/18

Abstract:
A thin film photoelectric conversion device for performing photoelectric conversion of a wide range of light, from the visible range to the infrared range, is provided. A plasmon resonance phenomenon, which enhances a photo-induced electric field, is caused in a wide range of light, by a metal nanostructure which is formed by annealing a substrate on which a first metal thin film layer composed of a first metal and a second metal thin film layer composed of a second metal which is partially overlapped onto the first metal thin film layer are laminated, and in which a periodic structure, wherein a number of first convex parts successively lie with a pitch of from one-tenth of a wavelength of an incident light to a wavelength equal to or shorter than the wavelength of the incident light in a planar direction along the substrate, is formed on the surface of the substrate; and a random structure, wherein a distance between any pair of a number of second convex parts formed at random positions on the substrate, or a distance between a second convex part and a first convex part is shorter than 100 nm, is formed on the substrate in a position within a region of the periodic structure or in a position adjacent to the region of the periodic structure, and as a result, high sensitivity photo-induced current is generated.
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