Invention Grant
US08436444B2 Thin film photoelectric conversion device and method for manufacturing thin film photoelectric conversion device 失效
薄膜光电转换装置及薄膜光电转换装置的制造方法

  • Patent Title: Thin film photoelectric conversion device and method for manufacturing thin film photoelectric conversion device
  • Patent Title (中): 薄膜光电转换装置及薄膜光电转换装置的制造方法
  • Application No.: US12681091
    Application Date: 2008-12-10
  • Publication No.: US08436444B2
    Publication Date: 2013-05-07
  • Inventor: Jose Briceno
  • Applicant: Jose Briceno
  • Applicant Address: JP Tokyo
  • Assignee: Si-Nano Inc.
  • Current Assignee: Si-Nano Inc.
  • Current Assignee Address: JP Tokyo
  • Agency: Westerman, Hattori, Daniels & Adrian, LLP
  • International Application: PCT/JP2008/003686 WO 20081210
  • International Announcement: WO2010/067398 WO 20100617
  • Main IPC: H01L31/18
  • IPC: H01L31/18
Thin film photoelectric conversion device and method for manufacturing thin film photoelectric conversion device
Abstract:
A thin film photoelectric conversion device for performing photoelectric conversion of a wide range of light, from the visible range to the infrared range, is provided. A plasmon resonance phenomenon, which enhances a photo-induced electric field, is caused in a wide range of light, by a metal nanostructure which is formed by annealing a substrate on which a first metal thin film layer composed of a first metal and a second metal thin film layer composed of a second metal which is partially overlapped onto the first metal thin film layer are laminated, and in which a periodic structure, wherein a number of first convex parts successively lie with a pitch of from one-tenth of a wavelength of an incident light to a wavelength equal to or shorter than the wavelength of the incident light in a planar direction along the substrate, is formed on the surface of the substrate; and a random structure, wherein a distance between any pair of a number of second convex parts formed at random positions on the substrate, or a distance between a second convex part and a first convex part is shorter than 100 nm, is formed on the substrate in a position within a region of the periodic structure or in a position adjacent to the region of the periodic structure, and as a result, high sensitivity photo-induced current is generated.
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