Invention Grant
- Patent Title: Method for producing a light-emitting element
- Patent Title (中): 发光元件的制造方法
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Application No.: US13561923Application Date: 2012-07-30
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Publication No.: US08435829B2Publication Date: 2013-05-07
- Inventor: Eisuke Negishi , Jiro Yamada , Mitsuhiro Kashiwabara , Hirofumi Nakamura , Seonghee Noh
- Applicant: Eisuke Negishi , Jiro Yamada , Mitsuhiro Kashiwabara , Hirofumi Nakamura , Seonghee Noh
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2009-273101 20091201
- Main IPC: H01L51/40
- IPC: H01L51/40
Abstract:
A method of producing a light-emitting element is provided. The method includes forming a first half-transmitting/reflecting film and a second half-transmitting/reflecting film sequentially on an organic layer by physical vapor deposition.
Public/Granted literature
- US20120295016A1 METHOD FOR PRODUCING A LIGHT-EMITTING ELEMENT Public/Granted day:2012-11-22
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