Invention Grant
- Patent Title: Magnetoresistance effect element and magnetic random access memory
- Patent Title (中): 磁阻效应元件和磁性随机存取存储器
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Application No.: US12665773Application Date: 2008-06-16
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Publication No.: US08416611B2Publication Date: 2013-04-09
- Inventor: Shunsuke Fukami , Nobuyuki Ishiwata
- Applicant: Shunsuke Fukami , Nobuyuki Ishiwata
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2007-166079 20070625
- International Application: PCT/JP2008/060993 WO 20080616
- International Announcement: WO2009/001706 WO 20081231
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/14 ; H01L29/82

Abstract:
A magnetoresistance effect element includes: a magnetization free layer; a spacer layer provided adjacent to the magnetization free layer; a first magnetization fixed layer provided adjacent to the spacer layer on a side opposite to the magnetization free layer; and at least two second magnetization fixed layers provided adjacent to the magnetization free layer. The magnetization free layer, the first magnetization fixed layer, and the second magnetization free layers respectively have magnetization components in a direction substantially perpendicular to film surfaces thereof. The magnetization free layer includes: two magnetization fixed portions; and a domain wall motion portion arranged between the two magnetization fixed portions. Magnetizations of the two magnetization fixed portions constituting the magnetization free layer are fixed substantially antiparallel to each other in directions substantially perpendicular to the film surface. The domain wall motion portion is provided with magnetic anisotropy in a direction perpendicular to the film surface.
Public/Granted literature
- US20100188890A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC RANDOM ACCESS MEMORY Public/Granted day:2010-07-29
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