Invention Grant
- Patent Title: Electrowetting device
- Patent Title (中): 电动搅拌装置
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Application No.: US12888778Application Date: 2010-09-23
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Publication No.: US08416503B2Publication Date: 2013-04-09
- Inventor: Incha Hsieh
- Applicant: Incha Hsieh
- Applicant Address: TW Luzhu Township
- Assignee: Hsieh, Incha
- Current Assignee: Hsieh, Incha
- Current Assignee Address: TW Luzhu Township
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G02B1/06
- IPC: G02B1/06 ; G02B3/12

Abstract:
An electrowetting device includes: a substrate having a non-hydrophobic insulating layer; a surrounding wall formed on an upper surface of the insulating layer; a microchamber surrounded by an inner surface of the surrounding wall and formed over the upper surface of the insulating layer; a hydrophobic coating layer that is applied to the inner surface of the surrounding wall and the upper surface of the insulating layer and that covers a seam between the inner surface and the upper surface; and a liquid disposed in the microchamber and on the hydrophobic coating layer.
Public/Granted literature
- US20110013255A1 Electrowetting Device Public/Granted day:2011-01-20
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