Invention Grant
- Patent Title: Lithographic apparatus and method
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Application No.: US12436635Application Date: 2009-05-06
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Publication No.: US08416395B2Publication Date: 2013-04-09
- Inventor: Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
- Applicant: Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58
Abstract:
A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
Public/Granted literature
- US08564763B2 Lithographic apparatus and method Public/Granted day:2013-10-22
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