Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12872683Application Date: 2010-08-31
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Publication No.: US08416385B2Publication Date: 2013-04-09
- Inventor: Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
- Applicant: Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03253420 20030530
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
Public/Granted literature
- US20100321652A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-12-23
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