Invention Grant
- Patent Title: Lithographic apparatus and method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US11987009Application Date: 2007-11-26
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Publication No.: US08416383B2Publication Date: 2013-04-09
- Inventor: Hernes Jacobs , Eva Mondt , Alexander Nikolov Zdravkov
- Applicant: Hernes Jacobs , Eva Mondt , Alexander Nikolov Zdravkov
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58 ; G03B27/32 ; G03B27/42 ; G03B27/60
Abstract:
A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
Public/Granted literature
- US20080165331A1 Lithographic apparatus and method Public/Granted day:2008-07-10
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