Invention Grant
- Patent Title: Semiconductor device having a multilayer structure
- Patent Title (中): 具有多层结构的半导体器件
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Application No.: US13117326Application Date: 2011-05-27
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Publication No.: US08415796B2Publication Date: 2013-04-09
- Inventor: Takaharu Yamano
- Applicant: Takaharu Yamano
- Applicant Address: JP Nagano-shi
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2010-140940 20100621
- Main IPC: H01L23/495
- IPC: H01L23/495

Abstract:
A semiconductor device includes a semiconductor substrate including a bump electrode, a first insulating layer formed on the semiconductor substrate and arranged to a lateral direction of the bump electrode, a first wiring layer formed on the first insulating layer and connected to the bump electrode, a second insulating layer formed on the first wiring layer, a via hole formed in the second insulating layer, and reaching the first wiring layer, a second wiring layer formed on the second insulating layer and connected to the first wiring layer via a via conductor formed in the via hole, and an external connection terminal connected to the second wiring layer, wherein an elastic modulus of the second insulating layer is set lower than an elastic modulus of the first insulating layer.
Public/Granted literature
- US20110309498A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-12-22
Information query
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