Invention Grant
US08411410B2 Flat Ni particle, laminated ceramic electronic component using flat Ni particle, and production method flat Ni particle 有权
平面Ni颗粒,使用平面Ni颗粒的层压陶瓷电子部件,以及平面Ni颗粒的生产方法

  • Patent Title: Flat Ni particle, laminated ceramic electronic component using flat Ni particle, and production method flat Ni particle
  • Patent Title (中): 平面Ni颗粒,使用平面Ni颗粒的层压陶瓷电子部件,以及平面Ni颗粒的生产方法
  • Application No.: US13403136
    Application Date: 2012-02-23
  • Publication No.: US08411410B2
    Publication Date: 2013-04-02
  • Inventor: Takao Hosokawa
  • Applicant: Takao Hosokawa
  • Applicant Address: JP Nagaokakyo-Shi, Kyoto-fu
  • Assignee: Murata Manufacturing Co., Ltd.
  • Current Assignee: Murata Manufacturing Co., Ltd.
  • Current Assignee Address: JP Nagaokakyo-Shi, Kyoto-fu
  • Agency: Dickstein Shapiro LLP
  • Priority: JP2009-231627 20091005
  • Main IPC: H01G4/00
  • IPC: H01G4/00
Flat Ni particle, laminated ceramic electronic component using flat Ni particle, and production method flat Ni particle
Abstract:
Provided is a flat Ni particle which has a large specific surface area, permitting efficient binder removal when the flat Ni particle is used for internal electrodes of a laminated ceramic electronic component. The flat Ni particle has a thickness t (m), a specific gravity ρ (g/m3), and a radius r (m), and a specific surface area S1 (m2/g), such that the specific surface area S1 is adapted to have a relationship of 1.5×S0
Information query
Patent Agency Ranking
0/0