Invention Grant
- Patent Title: Method and apparatus for forming resin film
- Patent Title (中): 树脂膜形成方法及装置
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Application No.: US12439583Application Date: 2007-08-22
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Publication No.: US08409671B2Publication Date: 2013-04-02
- Inventor: Naoto Ozawa , Takayuki Suzuki
- Applicant: Naoto Ozawa , Takayuki Suzuki
- Applicant Address: JP Tokyo
- Assignee: Origin Electric Company, Limited
- Current Assignee: Origin Electric Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Hoffmann & Baron, LLP
- Priority: JP2006-238930 20060904; JP2007-173921 20070702
- International Application: PCT/JP2007/066229 WO 20070822
- International Announcement: WO2008/029615 WO 20080313
- Main IPC: B05D3/00
- IPC: B05D3/00

Abstract:
A method for forming a resin film is provided in which a liquid material is cured by shifting irradiation of light from a central side to an outer circumferential side of a substrate during or after spreading a liquid material on the substrate by rotation, in which the light is annular, and an inner diameter and an outer diameter of the annular light are increased concentrically in relation to a central axis of rotation as irradiation time progresses, so that the annular light shifts from the central side to the outer circumferential side of the substrate.
Public/Granted literature
- US20100028558A1 METHOD AND APPARATUS FOR FORMING RESIN FILM Public/Granted day:2010-02-04
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