Invention Grant
- Patent Title: Method of fabricating semiconductor cleaners
- Patent Title (中): 制造半导体清洁剂的方法
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Application No.: US13408796Application Date: 2012-02-29
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Publication No.: US08409363B2Publication Date: 2013-04-02
- Inventor: Frank Weber
- Applicant: Frank Weber
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: B08B3/00
- IPC: B08B3/00

Abstract:
A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters.
Public/Granted literature
- US20120160270A1 Method of Fabricating Semiconductor Cleaners Public/Granted day:2012-06-28
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