Invention Grant
- Patent Title: X-ray analysis apparatus and X-ray analysis method
- Patent Title (中): X射线分析仪和X射线分析法
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Application No.: US12813049Application Date: 2010-06-10
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Publication No.: US08408789B2Publication Date: 2013-04-02
- Inventor: Toshiyuki Takahara
- Applicant: Toshiyuki Takahara
- Applicant Address: JP Chiba
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2009-198718 20090828
- Main IPC: A61B6/08
- IPC: A61B6/08

Abstract:
An X-ray analysis apparatus including: a radiation source configured to irradiate an irradiation point on a sample with radiation; an X-ray detector configured to detect a characteristic X-ray emitted from the sample, and output a signal including energy information about the characteristic X-ray; an analyzer configured to analyze the signal; a sample stage configured to allow placement of the sample thereon; a shifting mechanism being capable of relatively shifting the sample on the sample stage and the radiation source and the X-ray detector with respect to each other; a height measuring mechanism being capable of measuring the height of the irradiation point on the sample; and a controller configured to control the shifting mechanism on the basis of the measured height of the irradiation point on the sample and adjust the distance of the sample with respect to the radiation source and the X-ray detector is used.
Public/Granted literature
- US20110051894A1 X-RAY ANALYSIS APPARATUS AND X-RAY ANALYSIS METHOD Public/Granted day:2011-03-03
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