Invention Grant
US08405209B2 Semiconductor device with varying bump density regions and method of manufacturing the same
有权
具有不同凸块密度区域的半导体器件及其制造方法
- Patent Title: Semiconductor device with varying bump density regions and method of manufacturing the same
- Patent Title (中): 具有不同凸块密度区域的半导体器件及其制造方法
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Application No.: US12588394Application Date: 2009-10-14
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Publication No.: US08405209B2Publication Date: 2013-03-26
- Inventor: Kunihiro Takeda
- Applicant: Kunihiro Takeda
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2008-293191 20081117
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
Provided are a semiconductor device capable of reducing stress due to a density difference in the arrangement of bumps, and a method of manufacturing the semiconductor device. The semiconductor device includes: a wiring board including an electrode terminal group; a semiconductor chip including a bump formation surface where a bump group is formed and being mounted on the wiring board by using the bump group. The bump formation surface includes a first region where an area density of a region having bumps arranged therein is a first density, a second region where an area density of a region having bumps arranged therein is a second density lower than the first density, and a third region provided in a border portion between the first and second regions. In the third region, an area density of a region having bumps arranged therein is above the second density and below the first density.
Public/Granted literature
- US20100123244A1 Semiconductor device and method of manufacturing the same Public/Granted day:2010-05-20
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