Invention Grant
US08405209B2 Semiconductor device with varying bump density regions and method of manufacturing the same 有权
具有不同凸块密度区域的半导体器件及其制造方法

Semiconductor device with varying bump density regions and method of manufacturing the same
Abstract:
Provided are a semiconductor device capable of reducing stress due to a density difference in the arrangement of bumps, and a method of manufacturing the semiconductor device. The semiconductor device includes: a wiring board including an electrode terminal group; a semiconductor chip including a bump formation surface where a bump group is formed and being mounted on the wiring board by using the bump group. The bump formation surface includes a first region where an area density of a region having bumps arranged therein is a first density, a second region where an area density of a region having bumps arranged therein is a second density lower than the first density, and a third region provided in a border portion between the first and second regions. In the third region, an area density of a region having bumps arranged therein is above the second density and below the first density.
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