Invention Grant
US08405175B2 Suitably short wavelength light for laser annealing of silicon in DSA type systems
有权
适用于DSA型系统中硅的激光退火的短波长光
- Patent Title: Suitably short wavelength light for laser annealing of silicon in DSA type systems
- Patent Title (中): 适用于DSA型系统中硅的激光退火的短波长光
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Application No.: US13096888Application Date: 2011-04-28
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Publication No.: US08405175B2Publication Date: 2013-03-26
- Inventor: Stephen Moffatt
- Applicant: Stephen Moffatt
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L31/00
Abstract:
The present invention generally relates to a thermal processing apparatus and method that permits a user to index one or more preselected light sources capable of emitting one or more wavelengths to a collimator. Multiple light sources may permit a single apparatus to have the capability of emitting multiple, preselected wavelengths. The multiple light sources permit the user to utilize multiple wavelengths simultaneously to approximate “white light”. One or more of a frequency, intensity, and time of exposure may be selected for the wavelength to be emitted. Thus, the capabilities of the apparatus and method are flexible to meet the needs of the user.
Public/Granted literature
- US20110204045A1 SUITABLY SHORT WAVELENGTH LIGHT FOR LASER ANNEALING OF SILICON IN DSA TYPE SYSTEMS Public/Granted day:2011-08-25
Information query
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