Invention Grant
- Patent Title: Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method
- Patent Title (中): 用于去除光刻设备的未封装多层反射镜上的沉积的方法，光刻设备和器件制造方法
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Application No.: US12997149Application Date: 2009-06-09
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Publication No.: US08405051B2Publication Date: 2013-03-26
- Inventor: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- Applicant: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2009/057097 WO 20090609
- International Announcement: WO2010/006847 WO 20100121
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.
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