Invention Grant
- Patent Title: Photomask blank and method for manufacturing the same
- Patent Title (中): 光掩模坯料及其制造方法
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Application No.: US12935519Application Date: 2009-03-31
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Publication No.: US08404406B2Publication Date: 2013-03-26
- Inventor: Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
- Applicant: Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-090249 20080331
- International Application: PCT/JP2009/056603 WO 20090331
- International Announcement: WO2009/123166 WO 20091008
- Main IPC: G03F1/22
- IPC: G03F1/22
Abstract:
The present invention provides a photomask blank in which a light-shielding film consisting of a plurality of layers is provided on a light transmissive substrate, wherein a layer that is provided to be closest to the front surface is made of CrO, CrON, CrN, CrOC or CrOCN, and wherein the atom number density of the front-surface portion of the light-shielding film is 9×1022 to 14×1022 atms/cm3.
Public/Granted literature
- US20110081605A1 PHOTOMASK BLANK AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2011-04-07
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