Invention Grant
- Patent Title: Method for manufacturing diffractive optical element
- Patent Title (中): 衍射光学元件的制造方法
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Application No.: US12922647Application Date: 2009-11-13
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Publication No.: US08404136B2Publication Date: 2013-03-26
- Inventor: Kenichi Kurisu , Hideaki Imamura
- Applicant: Kenichi Kurisu , Hideaki Imamura
- Applicant Address: JP Osaka-shi JP Itami-shi
- Assignee: Sumitomo Electric Industries, Ltd.,Sumitomo Electric Hardmetal Corp.
- Current Assignee: Sumitomo Electric Industries, Ltd.,Sumitomo Electric Hardmetal Corp.
- Current Assignee Address: JP Osaka-shi JP Itami-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; Tamatane J. Aga
- Priority: JP2009-008848 20090119
- International Application: PCT/JP2009/069347 WO 20091113
- International Announcement: WO2010/082398 WO 20100722
- Main IPC: C23F1/00
- IPC: C23F1/00 ; B44C1/22

Abstract:
There is provided a method for manufacturing a diffractive optical element that can suppress the generation of heat from the inside of an insulative substrate and stabilize an etching rate. A method for manufacturing a diffractive optical element composed of an insulative substrate whose surface has a bumpy structure includes a selecting step of selecting an insulative substrate having an electrical resistivity equal to or higher than a certain value by measuring electrical resistivity of insulative substrates; and an etching step of forming a bumpy structure by dry etching in a surface of the insulative substrate selected in the selecting step.
Public/Granted literature
- US20110011831A1 METHOD FOR MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT Public/Granted day:2011-01-20
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