Invention Grant
US08400733B2 Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
有权
使具有前缘屏蔽（LES）和前缘锥度（LET）的PMR写入器的过程
- Patent Title: Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
- Patent Title (中): 使具有前缘屏蔽（LES）和前缘锥度（LET）的PMR写入器的过程
-
Application No.: US12954422Application Date: 2010-11-24
-
Publication No.: US08400733B2Publication Date: 2013-03-19
- Inventor: Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
- Applicant: Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
- Applicant Address: NL Amsterdam
- Assignee: HGST Netherlands B.V.
- Current Assignee: HGST Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Patterson & Sheridan, LLP
- Main IPC: G11B5/147
- IPC: G11B5/147
Abstract:
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
Public/Granted literature
- US20120127612A1 PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) Public/Granted day:2012-05-24
Information query
IPC分类:
