Invention Grant
US08399100B2 Reflection film, reflection film laminate, LED, organic EL display, and organic EL illuminating instrument
有权
反射膜,反射膜层压板,LED,有机EL显示器和有机EL照明仪器
- Patent Title: Reflection film, reflection film laminate, LED, organic EL display, and organic EL illuminating instrument
- Patent Title (中): 反射膜,反射膜层压板,LED,有机EL显示器和有机EL照明仪器
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Application No.: US12679633Application Date: 2008-09-25
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Publication No.: US08399100B2Publication Date: 2013-03-19
- Inventor: Jun Suzuki , Toshiki Sato , Takayuki Tsubota , Shinichi Tanifuji
- Applicant: Jun Suzuki , Toshiki Sato , Takayuki Tsubota , Shinichi Tanifuji
- Applicant Address: JP Kobe-shi
- Assignee: Kobe Steel, Ltd.
- Current Assignee: Kobe Steel, Ltd.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-247356 20070925; JP2007-262454 20071005; JP2008-168977 20080627
- International Application: PCT/JP2008/067336 WO 20080925
- International Announcement: WO2009/041529 WO 20090402
- Main IPC: B32B17/06
- IPC: B32B17/06 ; B32B27/36 ; B32B15/04

Abstract:
The present invention provides a reflection film, a reflection film laminate which are less likely to undergo agglomeration or sulfidation of an Ag thin film due to heat, and a LED, an organic EL display, and an organic EL illuminating instrument, each including any of these. The reflection film in accordance with the present invention is a reflection film formed on a substrate, characterized by being an Ag alloy film including Ag as a main component, and Bi in an amount of 0.02 atomic percent or more, and further including one or more of V, Ge, and Zn in a total content of 0.02 atomic percent or more, and satisfying the following expression (1): 7×[A]+13×[Bi]≦8 (1) where [A] (atomic percent) denotes the content of one or more of the V, Ge, and Zn, and [Bi] (atomic percent) denotes the content of Bi. Whereas, a reflection film laminate in accordance with the present invention is a reflection film laminate formed on a substrate, characterized by including: a first film comprising an Ag alloy film including Ag as a main component, and Bi in an amount of 0.02 atomic percent or more, and further including one or more of V, Ge, and Zn in a total content of 0.02 atomic percent or more, and satisfying the expression (1); and a second film including a Si oxide formed on the first film.
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