Invention Grant
- Patent Title: Tunable gas flow equalizer
- Patent Title (中): 可调气流均衡器
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Application No.: US12499742Application Date: 2009-07-08
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Publication No.: US08398814B2Publication Date: 2013-03-19
- Inventor: Ajit Balakrishna , Jason Andrew Kenney , Andrew Nguyen , Kenneth Collins
- Applicant: Ajit Balakrishna , Jason Andrew Kenney , Andrew Nguyen , Kenneth Collins
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: H01L21/3065
- IPC: H01L21/3065
Abstract:
A tunable gas flow equalizer is described. In an embodiment, the tunable flow equalizer includes a gas flow equalizer plate having primary opening and a secondary opening. The primary opening may surround a substrate support, and the secondary opening may be configured with a tuner. In an embodiment, the substrate support may be vertically adjustable with respect to the gas flow equalizer plate. The flow uniformity may be fine tuned by adjusting a tuner configured with a secondary opening in the gas flow equalizer plate and/or by adjusting the height of a vertically positionable substrate support plate having an inwardly tapered skirt 528 with respect to the gas flow equalizer plate 520.
Public/Granted literature
- US20110005680A1 TUNABLE GAS FLOW EQUALIZER Public/Granted day:2011-01-13
Information query
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