Invention Grant
- Patent Title: Pattern drawing method and pattern drawing apparatus
- Patent Title (中): 图案绘制方法和图案绘制装置
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Application No.: US12745295Application Date: 2008-12-05
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Publication No.: US08398227B2Publication Date: 2013-03-19
- Inventor: Jun Akedo , Akito Endo
- Applicant: Jun Akedo , Akito Endo
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo
- Agency: Young Basile
- Priority: JP2007-316154 20071206; JP2008-195512 20080729
- International Application: PCT/JP2008/072151 WO 20081205
- International Announcement: WO2009/072603 WO 20090611
- Main IPC: B41J2/01
- IPC: B41J2/01

Abstract:
Disclosed herein is a fine and thick wiring drawn at high speed in such a manner that a region on the substrate, on which region the liquid droplet is scheduled to impact, is heated beforehand, and that immediately after the impact of the liquid droplet on the substrate, the liquid droplet is promptly solidified so as thereby to suppress the spread of the liquid droplet due to the wettability of the liquid droplet to the substrate, and also to suppress the clogging of the nozzle due to the heating of the substrate. Thereby, even in the case where a liquid droplet having a larger volume than before is used, high-speed drawing of a thick and fine wiring having a line width approximately equal to the liquid droplet size is realized independently of the substrate material.
Public/Granted literature
- US20100302319A1 PATTERN DRAWING METHOD AND PATTERN DRAWING APPARATUS Public/Granted day:2010-12-02
Information query
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