Invention Grant
US08392012B2 Multiple libraries for spectrographic monitoring of zones of a substrate during processing
有权
用于在处理期间对衬底的区域进行光谱监测的多个库
- Patent Title: Multiple libraries for spectrographic monitoring of zones of a substrate during processing
- Patent Title (中): 用于在处理期间对衬底的区域进行光谱监测的多个库
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Application No.: US12258923Application Date: 2008-10-27
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Publication No.: US08392012B2Publication Date: 2013-03-05
- Inventor: Jeffrey Drue David , Boguslaw A. Swedek , Harry Q. Lee
- Applicant: Jeffrey Drue David , Boguslaw A. Swedek , Harry Q. Lee
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A computer-implemented method includes receiving a first sequence of current spectra of reflected light from a first zone of a substrate. A second sequence of current spectra of reflected light from a second zone of the substrate is received. Each current spectrum from the first sequence of current spectra is compared to a plurality of reference spectra from a first reference spectra library to generate a first sequence of best-match reference spectra. Each current spectrum from the second sequence of current spectra is compared to a plurality of reference spectra from a second reference spectra library to generate a second sequence of best-match reference spectra. The second reference spectra library is distinct from the first reference spectra library.
Public/Granted literature
- US20100105288A1 MULTIPLE LIBRARIES FOR SPECTROGRAPHIC MONITORING OF ZONES OF A SUBSTRATE DURING PROCESSING Public/Granted day:2010-04-29
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