Invention Grant
US08392012B2 Multiple libraries for spectrographic monitoring of zones of a substrate during processing 有权
用于在处理期间对衬底的区域进行光谱监测的多个库

Multiple libraries for spectrographic monitoring of zones of a substrate during processing
Abstract:
A computer-implemented method includes receiving a first sequence of current spectra of reflected light from a first zone of a substrate. A second sequence of current spectra of reflected light from a second zone of the substrate is received. Each current spectrum from the first sequence of current spectra is compared to a plurality of reference spectra from a first reference spectra library to generate a first sequence of best-match reference spectra. Each current spectrum from the second sequence of current spectra is compared to a plurality of reference spectra from a second reference spectra library to generate a second sequence of best-match reference spectra. The second reference spectra library is distinct from the first reference spectra library.
Information query
Patent Agency Ranking
0/0