Invention Grant
US08391588B2 Apparatus for examining pattern defects, a method thereof, and a computer-readable recording medium having recorded therein a program thereof
有权
用于检查图案缺陷的装置,其方法以及在其中记录有其程序的计算机可读记录介质
- Patent Title: Apparatus for examining pattern defects, a method thereof, and a computer-readable recording medium having recorded therein a program thereof
- Patent Title (中): 用于检查图案缺陷的装置,其方法以及在其中记录有其程序的计算机可读记录介质
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Application No.: US11813324Application Date: 2006-01-05
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Publication No.: US08391588B2Publication Date: 2013-03-05
- Inventor: Hiroyoshi Miyano
- Applicant: Hiroyoshi Miyano
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Whitham Curtis Christofferson & Cook, PC
- Priority: JP2005-000645 20050105
- International Application: PCT/JP2006/300034 WO 20060105
- International Announcement: WO2006/073155 WO 20060713
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
Utilizing only image information of an observation image and a reference image, a strain amount calculation unit calculates strain parameters. The reference image may be generated from design data or a different observation image. Calculated strain parameters are determined using strain formulation coefficients. A compensated image forming unit strains the reference image or the observation image by the strain amount based on the calculated strain parameters. The compensated image formed in the compensated image forming unit is supplied to an identification unit, which compares the compensated image with the reference image or the observation image, and determines positions where the difference is large to defects.
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