Invention Grant
US08391587B2 Liquid crystal array inspection apparatus and method for correcting imaging range 有权
液晶阵列检查装置及成像范围校正方法

  • Patent Title: Liquid crystal array inspection apparatus and method for correcting imaging range
  • Patent Title (中): 液晶阵列检查装置及成像范围校正方法
  • Application No.: US12995617
    Application Date: 2008-06-02
  • Publication No.: US08391587B2
    Publication Date: 2013-03-05
  • Inventor: Masamichi Nagai
  • Applicant: Masamichi Nagai
  • Applicant Address: JP Kyoto
  • Assignee: Shimadzu Corporation
  • Current Assignee: Shimadzu Corporation
  • Current Assignee Address: JP Kyoto
  • Agency: J.C. Patents
  • International Application: PCT/JP2008/060133 WO 20080602
  • International Announcement: WO2009/147707 WO 20091210
  • Main IPC: G06K9/00
  • IPC: G06K9/00
Liquid crystal array inspection apparatus and method for correcting imaging range
Abstract:
In a liquid crystal array inspection that acquires an imaging picture by scanning a liquid crystal substrate in a two-dimensional manner with an electron beam to inspect a liquid crystal substrate array based on the imaging picture, the imaging picture obtained by imaging a stage with the electron beam is used to determine the amounts of displacement of an imaging range of each electron gun in an X direction and a Y direction. Amounts of correction for correcting displacements of the imaging range of each electron gun in the X direction and the Y direction are calculated according to the determined amounts of displacement. The displacement in the X direction is corrected by controlling the scanning with the electron beam in the X direction, and the displacement in the Y direction is corrected by aligning a mounting position of each electron gun in the Y direction.
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