Invention Grant
- Patent Title: Liquid crystal array inspection apparatus and method for correcting imaging range
- Patent Title (中): 液晶阵列检查装置及成像范围校正方法
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Application No.: US12995617Application Date: 2008-06-02
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Publication No.: US08391587B2Publication Date: 2013-03-05
- Inventor: Masamichi Nagai
- Applicant: Masamichi Nagai
- Applicant Address: JP Kyoto
- Assignee: Shimadzu Corporation
- Current Assignee: Shimadzu Corporation
- Current Assignee Address: JP Kyoto
- Agency: J.C. Patents
- International Application: PCT/JP2008/060133 WO 20080602
- International Announcement: WO2009/147707 WO 20091210
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
In a liquid crystal array inspection that acquires an imaging picture by scanning a liquid crystal substrate in a two-dimensional manner with an electron beam to inspect a liquid crystal substrate array based on the imaging picture, the imaging picture obtained by imaging a stage with the electron beam is used to determine the amounts of displacement of an imaging range of each electron gun in an X direction and a Y direction. Amounts of correction for correcting displacements of the imaging range of each electron gun in the X direction and the Y direction are calculated according to the determined amounts of displacement. The displacement in the X direction is corrected by controlling the scanning with the electron beam in the X direction, and the displacement in the Y direction is corrected by aligning a mounting position of each electron gun in the Y direction.
Public/Granted literature
- US20110141137A1 LIQUID CRYSTAL ARRAY INSPECTION APPARATUS AND METHOD FOR CORRECTING IMAGING RANGE Public/Granted day:2011-06-16
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