Invention Grant
- Patent Title: Group III nitride semiconductor element and epitaxial wafer
- Patent Title (中): III族氮化物半导体元件和外延晶片
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Application No.: US13343595Application Date: 2012-01-04
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Publication No.: US08391327B2Publication Date: 2013-03-05
- Inventor: Yusuke Yoshizumi , Yohei Enya , Masaki Ueno , Fumitake Nakanishi
- Applicant: Yusuke Yoshizumi , Yohei Enya , Masaki Ueno , Fumitake Nakanishi
- Applicant Address: JP Osaka-shi
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; Tamatane J. Aga
- Priority: JP2008-099625 20080407
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A primary surface 23a of a supporting base 23 of a light-emitting diode 21a tilts by an off-angle of 10 degrees or more and less than 80 degrees from the c-plane. A semiconductor stack 25a includes an active layer having an emission peak in a wavelength range from 400 nm to 550 nm. The tilt angle “A” between the (0001) plane (the reference plane SR3 shown in FIG. 5) of the GaN supporting base and the (0001) plane of a buffer layer 33a is 0.05 degree or more and 2 degrees or less. The tilt angle “B” between the (0001) plane of the GaN supporting base (the reference plane SR4 shown in FIG. 5) and the (0001) plane of a well layer 37a is 0.05 degree or more and 2 degrees or less. The tilt angles “A” and “B” are formed in respective directions opposite to each other with reference to the c-plane of the GaN supporting base.
Public/Granted literature
- US20120104433A1 GROUP III NITRIDE SEMICONDUCTOR ELEMENT AND EPITAXIAL WAFER Public/Granted day:2012-05-03
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