Invention Grant
US08390808B1 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
有权
增强的OVL虚拟场使能即时OVL测量方法
- Patent Title: Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
- Patent Title (中): 增强的OVL虚拟场使能即时OVL测量方法
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Application No.: US13548656Application Date: 2012-07-13
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Publication No.: US08390808B1Publication Date: 2013-03-05
- Inventor: Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
- Applicant: Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01B11/00
- IPC: G01B11/00
Abstract:
A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
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