Invention Grant
US08390233B2 High resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment
有权
用于平面内位置和平面外俯仰/滚动对准的高分辨率弯曲平台
- Patent Title: High resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment
- Patent Title (中): 用于平面内位置和平面外俯仰/滚动对准的高分辨率弯曲平台
-
Application No.: US12628365Application Date: 2009-12-01
-
Publication No.: US08390233B2Publication Date: 2013-03-05
- Inventor: Vijay Shilpiekandula , Kamal Youcef-Toumi
- Applicant: Vijay Shilpiekandula , Kamal Youcef-Toumi
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gesmer Updegrove LLP
- Main IPC: G05B11/01
- IPC: G05B11/01

Abstract:
An adjustment structure used in conjunction with an imprinting structure is provided. The adjustment structure includes a sample mount for mounting a sample. An actuator mechanism is coupled to the sample mount, the actuator mechanism producing actuated forces on a X-Y plane to produce movements on a sample mount. A plurality of bladed flexures are positioned on the sample mount. The bladed flexures controls the movements of the sample mount produced by the actuator mechanism so as to allow adjustments in angular alignment about the pitch-roll (θX-θY) rotation axes or the X-Y plane relative to the sample mount so the imprinting structure can perform its operations on the sample.
Public/Granted literature
- US20100116161A1 HIGH RESOLUTION FLEXURAL STAGE FOR IN-PLANE POSITION AND OUT-OF-PLANE PITCH/ROLL ALIGNMENT Public/Granted day:2010-05-13
Information query