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US08390101B2 High voltage switching devices and process for forming same 有权
高压开关器件及其形成工艺

High voltage switching devices and process for forming same
Abstract:
The present invention relates to various switching device structures including Schottky diode, P-N diode, and P-I-N diode, which are characterized by low defect density, low crack density, low pit density and sufficient thickness (>2.5 um) GaN layers of low dopant concentration ( 2 KV).
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