Invention Grant
US08390097B2 Insulated gate bipolar transistor having contact region with variable width
有权
具有可变宽度的接触区域的绝缘栅双极晶体管
- Patent Title: Insulated gate bipolar transistor having contact region with variable width
- Patent Title (中): 具有可变宽度的接触区域的绝缘栅双极晶体管
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Application No.: US11623932Application Date: 2007-01-17
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Publication No.: US08390097B2Publication Date: 2013-03-05
- Inventor: Takuya Hamaguchi , Hideki Haruguchi , Tetsujiro Tsunoda
- Applicant: Takuya Hamaguchi , Hideki Haruguchi , Tetsujiro Tsunoda
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-268764 20060929
- Main IPC: H01L27/082
- IPC: H01L27/082

Abstract:
An IGBT comprises trenches arranged in strips, first emitter diffusion layers formed so as to extend in a direction intersecting the trenches, and contact regions formed to have a rectangular shape. The portions of the contact regions on the first emitter diffusion layers have a smaller width than the other portions, the width extending in the direction intersecting the trenches. This configuration allows for an increase in the emitter ballast resistance of the emitter diffusion layers, resulting in enhanced resistance to electrical breakdown due to short circuit.
Public/Granted literature
- US20080079066A1 INSULATED GATE SEMICONDUCTOR DEVICE Public/Granted day:2008-04-03
Information query
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