Invention Grant
- Patent Title: Area-efficient high voltage bipolar-based ESD protection targeting narrow design windows
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Application No.: US12944931Application Date: 2010-11-12
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Publication No.: US08390092B2Publication Date: 2013-03-05
- Inventor: Amaury Gendron , Chai Ean Gill , Vadim A. Kushner , Rouying Zhan
- Applicant: Amaury Gendron , Chai Ean Gill , Vadim A. Kushner , Rouying Zhan
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agency: Hamilton & Terrile, LLP
- Agent Michael Rocco Cannatti
- Main IPC: H01L23/58
- IPC: H01L23/58

Abstract:
An area-efficient, high voltage, single polarity ESD protection device (300) is provided which includes an p-type substrate (303); a first p-well (308-1) formed in the substrate and sized to contain n+ and p+ contact regions (310, 312) that are connected to a cathode terminal; a second, separate p-well (308-2) formed in the substrate and sized to contain only a p+ contact region (311) that is connected to an anode terminal; and an electrically floating n-type isolation structure (304, 306, 307-2) formed in the substrate to surround and separate the first and second semiconductor regions. When a positive voltage exceeding a triggering voltage level is applied to the cathode and anode terminals, the ESD protection device triggers an inherent thyristor into a snap-back mode to provide a low impedance path through the structure for discharging the ESD current.
Public/Granted literature
- US20120119331A1 Area-Efficient High Voltage Bipolar-Based ESD Protection Targeting Narrow Design Windows Public/Granted day:2012-05-17
Information query
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