Invention Grant
- Patent Title: Electrostatic discharge protection device and method of fabricating same
- Patent Title (中): 静电放电保护装置及其制造方法
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Application No.: US13361051Application Date: 2012-01-30
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Publication No.: US08390068B2Publication Date: 2013-03-05
- Inventor: Robert J. Gauthier, Jr. , Junjun Li , Souvick Mitra , Mahmoud A. Mousa , Christopher Stephen Putnam
- Applicant: Robert J. Gauthier, Jr. , Junjun Li , Souvick Mitra , Mahmoud A. Mousa , Christopher Stephen Putnam
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Anthony Canale
- Main IPC: H01L27/01
- IPC: H01L27/01 ; H01L29/74 ; H01L23/62

Abstract:
A silicon control rectifier and an electrostatic discharge protection device of an integrated circuit including the silicon control rectifier. The silicon control rectifier includes a silicon body formed in a silicon layer in direct physical contact with a buried oxide layer of a silicon-on-insulator substrate, a top surface of the silicon layer defining a horizontal plane; and an anode of the silicon control rectifier formed in a first region of the silicon body and a cathode of the silicon control rectifier formed in an opposite second region of the silicon body, wherein a path of current flow between the anode and the cathode is only in a single horizontal direction parallel to the horizontal plane.
Public/Granted literature
- US20120119257A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND METHOD OF FABRICATING SAME Public/Granted day:2012-05-17
Information query
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