Invention Grant
- Patent Title: Dual gate lateral double-diffused MOSFET (LDMOS) transistor
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Application No.: US12174471Application Date: 2008-07-16
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Publication No.: US08390057B1Publication Date: 2013-03-05
- Inventor: Marco A. Zuniga , Budong You
- Applicant: Marco A. Zuniga , Budong You
- Applicant Address: US CA Fremont
- Assignee: Volterra Semiconductor Corporation
- Current Assignee: Volterra Semiconductor Corporation
- Current Assignee Address: US CA Fremont
- Agency: Fish & Richardson P.C.
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
Method and apparatus for providing a lateral double-diffused MOSFET (LDMOS) transistor having a dual gate. The dual gate includes a first gate and a second gate. The first gate includes a first oxide layer formed over a substrate, and the second gate includes a second oxide layer formed over the substrate. The first gate is located a pre-determined distance from the second gate. A digitally implemented voltage regulator is also provided that includes a switching circuit having a dual gate LDMOS transistor.
Information query
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