Invention Grant
- Patent Title: Face-up optical semiconductor device and method
- Patent Title (中): 面朝上的光学半导体器件及方法
-
Application No.: US12978542Application Date: 2010-12-24
-
Publication No.: US08390020B2Publication Date: 2013-03-05
- Inventor: Satoshi Tanaka , Yusuke Yokobayashi
- Applicant: Satoshi Tanaka , Yusuke Yokobayashi
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kenealy Vaidya LLP
- Priority: JP2009-292068 20091224; JP2010-147349 20100629
- Main IPC: H01L33/38
- IPC: H01L33/38

Abstract:
A face-up optical semiconductor device can be prepared by forming an n-type GaN layer, an active layer, and a p-type GaN layer on a C-plane sapphire substrate. Parts of the p-type GaN layer and the active layer can be removed, and a transparent electrode can be formed over all or most of the remaining p-type GaN layer. A p-side electrode including a pad portion and auxiliary electrode portions can be formed on the transparent electrode layer. An n-side electrode can be formed on the exposed n-type GaN layer. On regions of the transparent electrode layer where weak light emission regions may be formed, outside independent electrodes can be provided. They can be disposed on concentric circles with the n-side electrode as a center or tangent lines thereof so as to be along the circles or the tangent lines. The outside independent electrodes can diffuse current from the p-side electrode to the n-side electrode flowing through the transparent electrode layer into the short side end portions of the transparent electrode layer, thereby decreasing the weak light emission regions.
Public/Granted literature
- US20110156087A1 FACE-UP OPTICAL SEMICONDUCTOR DEVICE AND METHOD Public/Granted day:2011-06-30
Information query
IPC分类: