Invention Grant
- Patent Title: Semiconductor light emitting device and method of fabricating semiconductor light emitting device
-
Application No.: US12874568Application Date: 2010-09-02
-
Publication No.: US08390012B2Publication Date: 2013-03-05
- Inventor: Toru Gotoda , Hajime Nago , Toshiyuki Oka , Kotaro Zaima , Shinya Nunoue
- Applicant: Toru Gotoda , Hajime Nago , Toshiyuki Oka , Kotaro Zaima , Shinya Nunoue
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-052209 20100309
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A semiconductor light emitting device has a support substrate, a light emitting element, and underfill material. The light emitting element includes a nitride-based group III-V compound semiconductor layer contacted via a bump on the support substrate. The underfill material is disposed between the support substrate and the light emitting element, the underfill material comprising a rib portion disposed outside of an end face of the light emitting element to surround the end surface of the light emitting element.
Public/Granted literature
- US08680548B2 Semiconductor light emitting device and method of fabricating semiconductor light emitting device Public/Granted day:2014-03-25
Information query
IPC分类: