Invention Grant
- Patent Title: Rapid prototyping device and method with indirect laser exposure
- Patent Title (中): 快速原型设备和间接激光曝光的方法
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Application No.: US12707818Application Date: 2010-02-18
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Publication No.: US08389896B2Publication Date: 2013-03-05
- Inventor: Tze Peng Chua , Matthias Jorgas , Harald Klemenz , Eng Cheong Lim , Pei Chyi Kristy Lim , Nisha Shakila Ma
- Applicant: Tze Peng Chua , Matthias Jorgas , Harald Klemenz , Eng Cheong Lim , Pei Chyi Kristy Lim , Nisha Shakila Ma
- Applicant Address: SG Singapore
- Assignee: Siemens Medical Instruments Pte. Ltd.
- Current Assignee: Siemens Medical Instruments Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- Priority: DE102009009503 20090218
- Main IPC: B23K26/00
- IPC: B23K26/00

Abstract:
It is desirable for the production of workpieces, which are sometimes produced by a rapid prototyping method, to be further automatable. To this end a device is provided having a laser for generating a laser beam in order to set a material, and a workpiece support which can be exposed directly to the laser. There is also provided an optical instrument for redirecting and deviating the laser beam so that the workpiece support can also be exposed indirectly to the laser. Material can therefore also be cured more easily in undercuts of workpiece blanks.
Public/Granted literature
- US20100224605A1 RAPID PROTOTYPING DEVICE AND METHOD WITH INDIRECT LASER EXPOSURE Public/Granted day:2010-09-09
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