Invention Grant
US08389755B2 Gas adsorption material, precursor of same, and method of producing gas adsorption material
有权
气体吸附材料,前体相同,以及生产气体吸附材料的方法
- Patent Title: Gas adsorption material, precursor of same, and method of producing gas adsorption material
- Patent Title (中): 气体吸附材料,前体相同,以及生产气体吸附材料的方法
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Application No.: US13074353Application Date: 2011-03-29
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Publication No.: US08389755B2Publication Date: 2013-03-05
- Inventor: Masahiro Furukawa , Masashi Goto
- Applicant: Masahiro Furukawa , Masashi Goto
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2008-250964 20080929
- Main IPC: C07F13/00
- IPC: C07F13/00 ; C07F1/00 ; C07F3/00 ; C07F15/00

Abstract:
A gas adsorption material has a three-dimensional structure wherein a ligand (p-hydroxybenzoic acid) having an aromatic ring as a principal skeleton containing, a carboxyl group and a functional group capable of forming a coordinate bond, the functional group being other than the carboxyl group, and a metal nucleus (Zn) are bonded to each other at a ratio of 1:1. The ligand contains a functional hydroxyl group other than the carboxyl group, and the carboxyl group and the functional group other than the carboxyl group are bonded in at least one position to the metal nucleus. The gas adsorption material is produced by drying a precursor obtained by reacting the ligand and the metal nucleus, dissolving the dried precursor in an organic solvent, heating and stirring a resultant solution to form a three-dimensional structure that includes the organic solvent as a crystal solvent, and removing the crystal solvent.
Public/Granted literature
- US20110178320A1 GAS ADSORPTION MATERIAL, PRECURSOR OF SAME, AND METHOD OF PRODUCING GAS ADSORPTION MATERIAL Public/Granted day:2011-07-21
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