Invention Grant
US08389594B2 Silicone-modified adamantane derivative, photo-radically curable resin composition, and method for preparing photo-radically curable resin composition
有权
硅氧烷改性金刚烷衍生物,光自由基固化性树脂组合物及光固化性树脂组合物的制造方法
- Patent Title: Silicone-modified adamantane derivative, photo-radically curable resin composition, and method for preparing photo-radically curable resin composition
- Patent Title (中): 硅氧烷改性金刚烷衍生物,光自由基固化性树脂组合物及光固化性树脂组合物的制造方法
-
Application No.: US13284368Application Date: 2011-10-28
-
Publication No.: US08389594B2Publication Date: 2013-03-05
- Inventor: Junichi Sawada
- Applicant: Junichi Sawada
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2010-262062 20101125
- Main IPC: C08F283/12
- IPC: C08F283/12 ; C08G77/04 ; C08G77/38 ; C07F7/02

Abstract:
There is disclosed a silicone-modified adamantane derivative represented by the following general formula (1), Wherein each R1 independently represents a hydrogen atom or methyl group; each R independently represents a methyl group or phenyl group; n represents an integer from 2 to 1,000; and k represents a number of 0 to 2. There can be a photo-radically curable resin composition by adopting a novel and specific silicone-modified adamantane derivative, which composition is cured by photoirradiation even at a lower intensity of illumination, thereby enabling to obtain a cured product exhibiting not only an excellent moisture resistance but also an excellent adhesiveness to various substrates.
Public/Granted literature
Information query