Invention Grant
- Patent Title: Combinatorial plasma enhanced deposition techniques
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Application No.: US13311926Application Date: 2011-12-06
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Publication No.: US08389419B2Publication Date: 2013-03-05
- Inventor: Sunil Shanker , Tony P. Chiang
- Applicant: Sunil Shanker , Tony P. Chiang
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/31
- IPC: H01L21/31
Abstract:
Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a second region of the substrate.
Public/Granted literature
- US20120077338A1 COMBINATORIAL PLASMA ENHANCED DEPOSITION TECHNIQUES Public/Granted day:2012-03-29
Information query
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