Invention Grant
- Patent Title: Laser beam machining method and semiconductor chip
- Patent Title (中): 激光束加工方法和半导体芯片
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Application No.: US12159338Application Date: 2006-12-26
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Publication No.: US08389384B2Publication Date: 2013-03-05
- Inventor: Takeshi Sakamoto , Kenichi Muramatsu
- Applicant: Takeshi Sakamoto , Kenichi Muramatsu
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- International Application: PCT/JP2006/325919 WO 20061226
- International Announcement: WO2007/074823 WO 20070705
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An object to be processed 1 comprising a substrate 4 and a plurality of functional devices 15 formed on a front face 3 of the substrate 4 is irradiated with laser light L while locating a converging point P within the substrate 4, so as to form at least one row of a divided modified region 72, at least one row of a quality modified region 71 positioned between the divided modified region 72 and the front face 3 of the substrate 4, and at least one row of an HC modified region 73 positioned between the divided modified region 72 and a rear face 21 of the substrate 4 for one line to cut 5. Here, in a direction along the line to cut, a forming density of the divided modified region 72 is made lower than that of the quality modified region 71 and that of the HC modified region 73.
Public/Granted literature
- US20090302428A1 LASER BEAM MACHINING METHOD AND SEMICONDUCTOR CHIP Public/Granted day:2009-12-10
Information query
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