Invention Grant
- Patent Title: Method for measuring optoelectronic memory device
- Patent Title (中): 光电子存储器件测量方法
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Application No.: US13559025Application Date: 2012-07-26
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Publication No.: US08389302B2Publication Date: 2013-03-05
- Inventor: Kung-Hwa Wei , Jeng-Tzong Sheu , Chen-Chia Chen , Mao-Yuan Chiu
- Applicant: Kung-Hwa Wei , Jeng-Tzong Sheu , Chen-Chia Chen , Mao-Yuan Chiu
- Applicant Address: TW Hsin-Chi
- Assignee: National Chiao Tung University
- Current Assignee: National Chiao Tung University
- Current Assignee Address: TW Hsin-Chi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW97132581A 20080826
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
A method for measuring an optoelectronic memory device, includes: grounding a source electrode of the optoelectronic memory device; applying a drain electrode voltage to a drain electrode of the optoelectronic memory device and measuring a first current at the drain electrode; using an optical source to illuminate the optoelectronic memory device and measure a first and a second current at the drain electrode; and comparing the sizes of the first current and the second current so as to judge the functional parameters of the optoelectronic memory device.
Public/Granted literature
- US20120286768A1 METHOD FOR MANUFACTURING OPTOELECTRONIC MEMORY DEVICE Public/Granted day:2012-11-15
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