Invention Grant
US08389205B2 Patterning nano-scale patterns on a film comprising unzipping polymer chains
失效
在包含解链聚合物链的膜上形成纳米尺度图案
- Patent Title: Patterning nano-scale patterns on a film comprising unzipping polymer chains
- Patent Title (中): 在包含解链聚合物链的膜上形成纳米尺度图案
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Application No.: US12482500Application Date: 2009-06-11
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Publication No.: US08389205B2Publication Date: 2013-03-05
- Inventor: Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
- Applicant: Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Jeffrey T. Holman
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
Public/Granted literature
- US20100316960A1 PATTERNING NANO-SCALE PATTERNS ON A FILM COMPRISING UNZIPPING POLYMER CHAINS Public/Granted day:2010-12-16
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