Invention Grant
- Patent Title: Magnet target and magnetron sputtering apparatus having the same
- Patent Title (中): 磁铁靶和磁控溅射装置
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Application No.: US12703302Application Date: 2010-02-10
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Publication No.: US08388819B2Publication Date: 2013-03-05
- Inventor: Xin Zhao , Wenyu Zhang
- Applicant: Xin Zhao , Wenyu Zhang
- Applicant Address: CN Beijing
- Assignee: Beijing Boe Optoelectronics Technology Co., Ltd.
- Current Assignee: Beijing Boe Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN200910078077 20090213
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
A magnet target comprising a fixing plate, a plurality of shafts arranged in an array, a plurality of connecting rods pivotably provided onto a plate surface of the fixing plate at one end and capable of rotating about corresponding one of the shafts, and a plurality of magnets that are each attached to the other fee end of one connecting rod. The magnets comprise magnets having external S poles and magnets having external N poles, and the magnets having external S poles and magnets having external N poles are arranged alternatively in an array.
Public/Granted literature
- US20100206726A1 MAGNET TARGET AND MAGNETRON SPUTTERING APPARATUS HAVING THE SAME Public/Granted day:2010-08-19
Information query
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