Invention Grant
US08388819B2 Magnet target and magnetron sputtering apparatus having the same 有权
磁铁靶和磁控溅射装置

Magnet target and magnetron sputtering apparatus having the same
Abstract:
A magnet target comprising a fixing plate, a plurality of shafts arranged in an array, a plurality of connecting rods pivotably provided onto a plate surface of the fixing plate at one end and capable of rotating about corresponding one of the shafts, and a plurality of magnets that are each attached to the other fee end of one connecting rod. The magnets comprise magnets having external S poles and magnets having external N poles, and the magnets having external S poles and magnets having external N poles are arranged alternatively in an array.
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