Invention Grant
US08388137B2 System and method for analyzing wavefront aberrations 有权
用于分析波前像差的系统和方法

System and method for analyzing wavefront aberrations
Abstract:
A method of creating a statistical model for use in predicting vision correction prescriptions for patients is disclosed. The method comprises obtaining a plurality of wavefront aberration measurements from a plurality of patient's eyes, obtaining a plurality of visual acuity measurements from the plurality of patients, applying values associated with the plurality of wavefront measurements to an input layer of a statistical model, applying values associated with the plurality of visual acuity measurements to an output layer of the statistical model, and generating a plurality of weight values associated with respective nodes of the statistical model based on the applied values associated with the plurality of wavefront measurements and corresponding values associated with the plurality of visual acuity measurements.
Public/Granted literature
Information query
Patent Agency Ranking
0/0