Invention Grant
- Patent Title: System and method for analyzing wavefront aberrations
- Patent Title (中): 用于分析波前像差的系统和方法
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Application No.: US13099190Application Date: 2011-05-02
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Publication No.: US08388137B2Publication Date: 2013-03-05
- Inventor: Andreas W. Dreher , Shui T. Lai
- Applicant: Andreas W. Dreher , Shui T. Lai
- Applicant Address: US CA Vista
- Assignee: Ophthonix, Inc.
- Current Assignee: Ophthonix, Inc.
- Current Assignee Address: US CA Vista
- Agency: Morrison & Foerster LLP
- Main IPC: A61B3/00
- IPC: A61B3/00

Abstract:
A method of creating a statistical model for use in predicting vision correction prescriptions for patients is disclosed. The method comprises obtaining a plurality of wavefront aberration measurements from a plurality of patient's eyes, obtaining a plurality of visual acuity measurements from the plurality of patients, applying values associated with the plurality of wavefront measurements to an input layer of a statistical model, applying values associated with the plurality of visual acuity measurements to an output layer of the statistical model, and generating a plurality of weight values associated with respective nodes of the statistical model based on the applied values associated with the plurality of wavefront measurements and corresponding values associated with the plurality of visual acuity measurements.
Public/Granted literature
- US20110255053A1 SYSTEM AND METHOD FOR ANALYZING WAVEFRONT ABERRATIONS Public/Granted day:2011-10-20
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