Invention Grant
US08387194B2 Apparatus for reducing buildup of deposits in semiconductor processing equipment 有权
用于减少半导体加工设备中沉积物堆积的装置

  • Patent Title: Apparatus for reducing buildup of deposits in semiconductor processing equipment
  • Patent Title (中): 用于减少半导体加工设备中沉积物堆积的装置
  • Application No.: US12974613
    Application Date: 2010-12-21
  • Publication No.: US08387194B2
    Publication Date: 2013-03-05
  • Inventor: Eugene J. Mayer
  • Applicant: Eugene J. Mayer
  • Applicant Address: US NC Durham
  • Assignee: Cree, Inc.
  • Current Assignee: Cree, Inc.
  • Current Assignee Address: US NC Durham
  • Agency: Myers Bigel Sibley & Sajovec
  • Main IPC: B08B9/00
  • IPC: B08B9/00
Apparatus for reducing buildup of deposits in semiconductor processing equipment
Abstract:
An apparatus for cleaning a gas tube includes an actuator and a plunger head attached to the actuator. The actuator is configured to reciprocate the plunger head along a longitudinal axis of the gas tube between a retracted position and an extended position and to rotate the plunger head from a first angular position to a second angular position. A method of cleaning a gas tube includes positioning a plunger head including a plurality of longitudinally extending tines in the gas tube, rotating the plunger head relative to a longitudinal axis of the gas tube, and scraping deposits from an interior surface of the gas tube using longitudinally extending edges of the tines.
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