Invention Grant
US08387194B2 Apparatus for reducing buildup of deposits in semiconductor processing equipment
有权
用于减少半导体加工设备中沉积物堆积的装置
- Patent Title: Apparatus for reducing buildup of deposits in semiconductor processing equipment
- Patent Title (中): 用于减少半导体加工设备中沉积物堆积的装置
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Application No.: US12974613Application Date: 2010-12-21
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Publication No.: US08387194B2Publication Date: 2013-03-05
- Inventor: Eugene J. Mayer
- Applicant: Eugene J. Mayer
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Myers Bigel Sibley & Sajovec
- Main IPC: B08B9/00
- IPC: B08B9/00

Abstract:
An apparatus for cleaning a gas tube includes an actuator and a plunger head attached to the actuator. The actuator is configured to reciprocate the plunger head along a longitudinal axis of the gas tube between a retracted position and an extended position and to rotate the plunger head from a first angular position to a second angular position. A method of cleaning a gas tube includes positioning a plunger head including a plurality of longitudinally extending tines in the gas tube, rotating the plunger head relative to a longitudinal axis of the gas tube, and scraping deposits from an interior surface of the gas tube using longitudinally extending edges of the tines.
Public/Granted literature
- US20110088184A1 Apparatus for Reducing Buildup of Deposits in Semiconductor Processing Equipment Public/Granted day:2011-04-21
Information query
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