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US08385098B2 Ferroelectric memory devices and operating methods thereof 有权
铁电存储器件及其操作方法

Ferroelectric memory devices and operating methods thereof
Abstract:
A ferroelectric memory device having a NAND array of a plurality of ferroelectric memory cells includes: a fully depleted channel layer; a gate electrode layer; and a ferroelectric layer located between the channel layer and the gate electrode layer. The data of the plurality of ferroelectric memory cells is erased by applying a first erase voltage to a bit line and a common source line and applying a second erase voltage to a string selection line and a ground selection line.
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