Invention Grant
- Patent Title: Ferroelectric memory devices and operating methods thereof
- Patent Title (中): 铁电存储器件及其操作方法
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Application No.: US12923131Application Date: 2010-09-03
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Publication No.: US08385098B2Publication Date: 2013-02-26
- Inventor: Ki-ha Hong , Jeong-seob Kim , Jai-kwang Shin
- Applicant: Ki-ha Hong , Jeong-seob Kim , Jai-kwang Shin
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2009-0091360 20090925
- Main IPC: G11C11/22
- IPC: G11C11/22

Abstract:
A ferroelectric memory device having a NAND array of a plurality of ferroelectric memory cells includes: a fully depleted channel layer; a gate electrode layer; and a ferroelectric layer located between the channel layer and the gate electrode layer. The data of the plurality of ferroelectric memory cells is erased by applying a first erase voltage to a bit line and a common source line and applying a second erase voltage to a string selection line and a ground selection line.
Public/Granted literature
- US20110075467A1 Ferroelectric memory devices and operating methods thereof Public/Granted day:2011-03-31
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