Invention Grant
- Patent Title: Methods and systems for inspection of a specimen using different inspection parameters
- Patent Title (中): 使用不同检查参数检验样品的方法和系统
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Application No.: US12796047Application Date: 2010-06-08
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Publication No.: US08384887B2Publication Date: 2013-02-26
- Inventor: Steve R. Lange , Paul Frank Marella , Nat Ceglio , Shiow-Hwei Hwang , Tao-Yi Fu
- Applicant: Steve R. Lange , Paul Frank Marella , Nat Ceglio , Shiow-Hwei Hwang , Tao-Yi Fu
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Methods and systems for inspection of a specimen using different parameters are provided. One computer-implemented method includes determining optimal parameters for inspection based on selected defects. This method also includes setting parameters of an inspection system at the optimal parameters prior to inspection. Another method for inspecting a specimen includes illuminating the specimen with light having a wavelength below about 350 nm and with light having a wavelength above about 350 nm. The method also includes processing signals representative of light collected from the specimen to detect defects or process variations on the specimen. One system configured to inspect a specimen includes a first optical subsystem coupled to a broadband light source and a second optical subsystem coupled to a laser. The system also includes a third optical subsystem configured to couple light from the first and second optical subsystems to an objective, which focuses the light onto the specimen.
Public/Granted literature
- US20100238433A1 METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT INSPECTION PARAMETERS Public/Granted day:2010-09-23
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