Invention Grant
- Patent Title: Method for texturing silicon wafers, treatment liquid therefor, and use
- Patent Title (中): 硅片晶化方法，处理液及其用途
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Application No.: US13224821Application Date: 2011-09-02
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Publication No.: US08383523B2Publication Date: 2013-02-26
- Inventor: Izaaryene Maher
- Applicant: Izaaryene Maher
- Applicant Address: DE
- Assignee: Gebr. Schmid GmbH
- Current Assignee: Gebr. Schmid GmbH
- Current Assignee Address: DE
- Agency: Akerman Senterfitt
- Priority: DE102009012827 20090303
- Main IPC: C23F1/00
- IPC: C23F1/00 ; C25F3/00 ; C03C15/00 ; C03C25/68 ; H01L21/00 ; H01L21/461 ; H01L21/302
Abstract:
In a method for the treatment of silicon wafers in the production of solar cells, a treatment liquid is applied to the surface of the silicon wafers for the purpose of texturization thereof. The treatment liquid contains, as additive, ethyl hexanol or cyclohexanol in an amount ranging from 0.5% to 3%, by weight.
Public/Granted literature
- US20120034725A1 METHOD FOR TEXTURING SILICON WAFERS, TREATMENT LIQUID THEREFOR, AND USE Public/Granted day:2012-02-09
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