Invention Grant
- Patent Title: Memory word line boost using thin dielectric capacitor
- Patent Title (中): 使用薄介质电容的存储字线升压
-
Application No.: US12949261Application Date: 2010-11-18
-
Publication No.: US08369180B2Publication Date: 2013-02-05
- Inventor: Hung-Chang Yu , Yue-Der Chih
- Applicant: Hung-Chang Yu , Yue-Der Chih
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman Ham & Berner, LLP
- Main IPC: G11C8/00
- IPC: G11C8/00

Abstract:
A memory includes a word line and a word line boost circuit. The word line boost circuit includes a capacitor having a capacitor dielectric thickness, and a transmission gate coupled to the word line and the capacitor. The transmission gate has a gate-dielectric thickness that is greater than the capacitor dielectric thickness. The word line boost circuit is configured to supply a high voltage that is higher than a power supply voltage to the word line during an operation of the memory by utilizing the capacitor.
Public/Granted literature
- US20120127806A1 MEMORY WORD LINE BOOST USING THIN DIELECTRIC CAPACITOR Public/Granted day:2012-05-24
Information query