Invention Grant
US08368378B2 Plasma measurement device, plasma system, and method for measuring plasma characteristics
有权
等离子体测量装置,等离子体系统和等离子体特性测量方法
- Patent Title: Plasma measurement device, plasma system, and method for measuring plasma characteristics
- Patent Title (中): 等离子体测量装置,等离子体系统和等离子体特性测量方法
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Application No.: US12694412Application Date: 2010-01-27
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Publication No.: US08368378B2Publication Date: 2013-02-05
- Inventor: Ta-Lun Sung , Chung-Ming Liu , Kuen Ting , Shosaku Matsumura , Shinriki Teii
- Applicant: Ta-Lun Sung , Chung-Ming Liu , Kuen Ting , Shosaku Matsumura , Shinriki Teii
- Applicant Address: TW Taoyuan County
- Assignee: Lunghwa University of Science and Technology
- Current Assignee: Lunghwa University of Science and Technology
- Current Assignee Address: TW Taoyuan County
- Agency: Kamrath IP Lawfirm, P.A.
- Agent Alan Kamrath
- Priority: TW98122588A 20090703
- Main IPC: G01N27/66
- IPC: G01N27/66

Abstract:
A plasma measurement device used for measuring plasma characteristics of radio frequency plasma a probe, a connector electronic wire, and a power supply device. The probe is used for entering the radio frequency plasma to measure the plasma characteristics. One end of the connector electronic wire is electrically connected to the probe. The power supply device is electrically connected to another end of the connector electronic wire, and the power supply device is used for providing a voltage to the probe. The connector electronic wire is a specific length, and the connector electronic wire and the radio frequency plasma would generate a standing wave effect. Thus, according to the standing wave effect, the plasma measurement device could eliminate high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
Public/Granted literature
- US20110001465A1 Plasma Measurement Device, Plasma System, and Method for Measuring Plasma Characteristics Public/Granted day:2011-01-06
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